Ion Irradiation Facility - M

Categories: Ion beam facilities
Manufacturer: DREEBIT GmbH
The IIF-M is an ion irradiation facility for experiments with a broad range of ion types from low-charged ions or molecule fragments up to highly charged ions. It can be equipped with different DREEBIT ion sources such as a Dresden EBIS/T or Dresden ECRIS.
Print

Description

The IIF-M is an ion irradiation facility for experiments with a broad range of ion types from low-charged ions or molecule fragments up to highly charged ions. It can be equipped with different DREEBIT ion sources such as a Dresden EBIS/T or Dresden ECRIS. Depending on the ion source operation mode, continuous ion beams or ion pulses are transported through the beamline using ion optical elements (Einzel lenses, deflector elements) and ion beam diagnostics (Faraday cups). Ion species separation is realized by a double focusing dipole magnet. The complete ion beamline, the ion source, as well as the target chamber are all designed for ultra high vacuum operation. A command and control system is delivered to operate the IIF-M via computer and automatically analyze the produced spectrum of ions.

The following table gives an overview of typical ion output values of the facility equipped with a Dresden EBIS-A. The values depend on the chosen source parameters which were optimized for each individual charge state in the given table. Higher and lower ion outputs are possible if another ion source is chosen. The values were recorded before deceleration into the target chamber.

Ion Species Ions / s (DC) Ions / s (Pulsed)
H+ (fully ionized) 2 · 1010 1 · 1010 at 100 Hz
H2+ 2 · 1010  
He2+ (fully ionized) 6 · 108  
C4+ (He-like)   1 · 109 at 2 Hz
C6+ (fully ionized)   1 · 108 at 2 Hz
Ar+ 2 · 109  
Ar8+ (Ne-like) 2 · 108 1 · 108 at 10 Hz
Ar16+ (He-like)   7 · 106 at 1 Hz
Ar18+ (fully ionized)   1 · 105 at 1 Hz
Kr26+ (Ne-like) 2 · 106  
Xe44+ (Ne-like)   6 · 104 at 0.2 Hz
Au51+ (Ni-like)   7 · 105 at 1.4 Hz
Au60+   4 · 103 at 0.4 Hz

 

Parameters

Facility Parameters
source potential ca. 1 kV up to 20 kV (depending on ion source type)
ion energy at target chamber equals source potential x ion charge
ion pulse width 50 ns up to 100 µs
General Parameters
dimensions (length x width x height) 3.5 m x 2 m x 2.5 m
weight ~ 500 kg
Infrastructural Requirements
cooling water multiple cooling water circuits, 1.5 l / min at 3 bar each
electrical power consumption up to 15 kW (depending on source type)

Scope of Delivery

  • ion source of the EBIS/T or ECRIS type
  • beamline with ion optical elements and Faraday cups for beam transportation
  • dipole bending magnet for ion species separation
  • target chamber
  • beamline support rack
  • control racks equipped with all power supplies required for the operation of the IIF-M
  • remote control system including computer and software

Optional Equipment

  • beryllium window for inline x-ray spectroscopy at the ion source
  • spare electron gun for EBIS/T ion sources
  • additional ion beam diagnostics such as pepperpot emittance meter or retarding eld analyzer
  • Metal Ion injection from Volatile Compounds (MIVoC) kit
  • metal ion injection kit including pulsed quadrupole beam bender and liquid metal ion source
  • target chamber equipment such as sample holders, linear feedthroughs, load lock, etc.
  • heating equipment including temperature control for the entire beamline

Downloads

ProductSheet_IIF-M.pdf

(225.61 KiB)


Reference Facilities

Related Products

Ion Irradiation Facility - L

DREEBIT’s Most Versatile Ion Irradiation Facility Including Ion Deceleration

Ion Irradiation Facility - S

An Ultra-Compact Version of DREEBIT's Standard Ion Irradiation Facility